BIPM.EM-K12
MEASURAND : Resistance (measurement based on a quantum Hall resistance standard)
NOMINAL VALUE : 100 Ω
Degrees of equivalence represented by Di and its expanded uncertainty Ui (k = 2), both expressed in10-9.
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 100 Ω / 1 Ω
Degrees of equivalence represented by Di and its expanded uncertainty Ui (k = 2), both expressed in 10-9.
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 10 kΩ / 100 Ω
Degrees of equivalence represented by Di and its expanded uncertainty Ui (k = 2), both expressed in 10-9.
BIPM.EM-K12
MEASURAND : Resistance (measurement based on a quantum Hall resistance standard)
NOMINAL VALUE : 100 Ω
Degrees of equivalence represented by Di and its expanded uncertainty Ui (k = 2), both expressed in10-9.
LABi | Di | Uneg,i | Upos,i | |
---|---|---|---|---|
10-9 |
10-9 |
10-9 |
||
LNE | -1.2 | 6.0 | ||
NPL | 0.1 | 7.8 | ||
NIST | 1.2 | 4.0 | ||
PTB | -0.5 | 4.4 | ||
CMI | -0.6 | 5.0 | ||
METAS | 0.5 | 4.6 | ||
NRC | -0.5 | 4.6 | ||
NMIJ | 1.8 | 17.4 | ||
NMC, A*STAR | 1.6 | 6.6 | ||
NIM | -0.4 | 5.2 | ||
KRISS | -0.4 | 4.8 |
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 100 Ω / 1 Ω
Degrees of equivalence represented by Di and its expanded uncertainty Ui (k = 2), both expressed in 10-9.
LABi | Di | Uneg,i | Upos,i | |
---|---|---|---|---|
10-9 |
10-9 |
10-9 |
||
LNE | -3.2 | 8.8 | ||
METAS | 0.8 | 5.4 | ||
NPL | 2.8 | 9.6 | ||
NIST | 3.8 | 6.2 | ||
PTB | -0.8 | 8.0 | ||
CMI | 3.3 | 6.4 | ||
NRC | 0.1 | 8.0 | ||
NIM | -1.0 | 4.6 | ||
KRISS | -0.2 | 4.6 |
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 10 kΩ / 100 Ω
Degrees of equivalence represented by Di and its expanded uncertainty Ui (k = 2), both expressed in 10-9.
LABi | Di | Uneg,i | Upos,i | |
---|---|---|---|---|
10-9 |
10-9 |
10-9 |
||
LNE | 2.2 | 6.6 | ||
NPL | 3.3 | 6.4 | ||
NIST | 5.9 | 11.0 | ||
PTB | 0.7 | 3.8 | ||
CMI | 1.1 | 4.4 | ||
METAS | 0.2 | 3.8 | ||
NRC | 1.3 | 4.2 | ||
NMIJ | 6.8 | 16.6 | ||
NMC, A*STAR | -2.0 | 5.6 | ||
NIM | 5.0 | 4.8 | ||
KRISS | 0.8 | 5.2 |
Metrology area, Sub-field | Electricity and Magnetism, Resistance |
Description | Quantum Hall resistance standards and their scaling to other resistance values |
Time of measurements | 1993 - |
Status | Continuous, approved for equivalence |
Measurand | Resistance and resistance ratios 100 Ω, 10 kΩ/100 Ω, and 100 Ω/1 Ω |
Transfer device | BIPM quantum Hall standard and resistors |
Comparison type | Key Comparison |
Consultative Committee | CCEM (Consultative Committee for Electricity and Magnetism) |
Conducted by | BIPM (Bureau International des Poids et Mesures) |
Comments | First results published on 20 November 2000 Most recent update: 5 October 2021 |
Pilot institute |
BIPM
Bureau International des Poids et Mesures BIPM - International Organization |
Contact person | P. Gournay +33 (0) 1 45 07 70 07 |
Pilot laboratory | |
---|---|
BIPM |
Bureau International des Poids et Mesures, BIPM - International Organization, N/A |
CMI |
Czech Metrology Institute, Czechia, EURAMET |
2017 |
KRISS |
Korea Research Institute of Standards and Science, Korea, Republic of, APMP |
2019 |
LNE |
Laboratoire national de métrologie et d'essais, France, EURAMET |
1993 | |
2023 |
METAS |
Federal Institute of Metrology, Switzerland, EURAMET |
1994 | |
2017 |
NIM |
National Institute of Metrology, China, APMP |
2019 |
NIST |
National Institute of Standards and Technology, United States, SIM |
1999 |
NMC, A*STAR |
National Metrology Centre, Agency for Science, Technology and Research, Singapore, APMP |
2019 |
NMIJ AIST |
National Metrology Institute of Japan, Japan, APMP |
2018 |
- |
NPL |
National Physical Laboratory, United Kingdom, EURAMET |
1997 |
NRC |
National Research Council, Canada, SIM |
2018 |
PTB |
Physikalisch-Technische Bundesanstalt, Germany, EURAMET |
1995 | |
2013 |
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BIPM.EM-K12
MEASURAND : Resistance (measurement based on a quantum Hall resistance standard)
NOMINAL VALUE : 100 Ω
The key comparison reference value is the BIPM determination.
The degree of equivalence of each laboratory i relative to the key comparison reference value is given by a pair of terms, both expressed in 10-9:
Di = xi and its expanded uncertainty Ui (k = 2) where Ui = 2 ui.
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 100 Ω / 1 Ω
The key comparison reference value is the BIPM determination.
The degree of equivalence of each laboratory i relative to the key comparison reference value is given by a pair of terms, both expressed in 10-9:
Di = xi and its expanded uncertainty Ui (k = 2) where Ui = 2 ui.
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 10 kΩ / 100 Ω
The key comparison reference value is the BIPM determination.
The degree of equivalence of laboratory i relative to the key comparison reference value is given by a pair of terms, both expressed in 10-9:
Di = xi and its expanded uncertainty Ui (k = 2) where Ui = 2 ui.
BIPM.EM-K12
MEASURAND : Resistance (measurement based on a quantum Hall resistance standard)
NOMINAL VALUE : 100 Ω
xi relative difference between the result of measurement of laboratory i and that of the BIPM
ui combined standard uncertainty of xi
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 100 Ω / 1 Ω
xi relative difference between the result of measurement of laboratory i and that of the BIPM
ui combined standard uncertainty of xi
BIPM.EM-K12
MEASURAND Resistance ratio (measurement linked to a quantum Hall resistance standard)
NOMINAL VALUE 10 kΩ / 100 Ω
xi relative difference between the result of measurement of laboratory i and that of the BIPM
ui combined standard uncertainty of xi